Calibration Standards
EUV, X-Ray and visible light calibration standards
Customizable High-Resolution Calibration Standards
The ANT calibration standard was designed for the highest resolution requirements of X-Ray imaging systems with nanoscale features. Available for both soft and hard X-Ray regimes, EUV and optical setups.
Nested Ls or elbows allow for high resolution measurements with guaranteed pitch and efficiency. Down to 15 nm half-pitch on high resolution standard.
![](/wp-content/uploads/2020/03/OJ23_34.jpg)
Siemen star patterns allow for calibration and accurate comparison of the resolution of optics for X-Ray and other imaging methods.
![](/wp-content/uploads/2020/04/OJ23_19.jpg)
Applied Nanotools has included the USAF 1951 resolution test chart but with features in nanometres instead of micrometres.
![](/wp-content/uploads/2020/04/OJ23_01.jpg)
These varying line and spaces are useful for inspection and determining the resolution of a system.
![](/wp-content/uploads/2020/04/YS24_83.jpg)
Hard X-ray Calibration Standards are useful for energies above 5000 eV with a standard thickness of 500-600 nm and features down to 25 nm for the HXR-CAL model and 2000 nm gold thickness with features down to 200 nm.
![](/wp-content/uploads/2020/05/YQ22_062_optimized.jpg)
Soft X-ray Calibration Standards are useful for EUV and soft x-ray energies up to 2000 eV with a standard thickness of 200 nm and features down to 25 nm for the SXR-CAL model and down to 15 nm for the ultra-high resolution version.
![](/wp-content/uploads/2020/04/YQ22_052_2-1024x532.jpg)
![](/wp-content/uploads/2020/04/YQ22_052_2-1024x532.jpg)
TEM Calibration Standards are useful for TEM and SEM systems to determine the resolution of a system and other diagnostics. With a 50 nm thick membrane, these standards are useful for transmission and reflection modes.
![](/wp-content/uploads/2022/12/TEM-Calibration-Standard-15-nm-1024x657.png)
![](/wp-content/uploads/2022/12/TEM-Calibration-Standard-15-nm-1024x657.png)
Custom designs and logos can be added to designs, see pricing for more information on costs.
![](/wp-content/uploads/2020/05/YQ22_062_optimized.jpg)
![](/wp-content/uploads/2020/05/YQ22_062_optimized.jpg)
![](/wp-content/uploads/2020/05/YQ22_062_optimized.jpg)
Our standard frame size is 5 mm x 5 mm. We also offer custom frame sizes. Membrane thickness can be down to 50 nm and silicon carbide membranes are available for those requiring long-lifetime membranes.
![](/wp-content/uploads/2020/04/Chip-Sizes.png)
![](/wp-content/uploads/2020/04/Chip-Sizes.png)
The dimensions of the our lightweight aluminum holder are 14 mm tall x 14 mm wide x 3 mm deep and simplify handling of the calibration standards.
The Standard Layout
![](/wp-content/uploads/2020/04/Calb_Layout_2.png)
![](/wp-content/uploads/2020/04/Calb_Layout_2.png)
Options (for different energies)
Device | Target Energies |
EUV Free-standing silicon nanoUSAF1951 (>100 nm Si3N4u)
(negative polarity, etched into Si3N4 membrane) |
10-90 eV (124-14 nm) |
Ultra-High Resolution Soft X-Ray Calibration Standard (70 nm Au)
(15 nm half pitch) |
100 - 500 eV |
Soft X-Ray Calibration Standard (150 nm Au)
(25 nm half pitch or better) |
100 - 1000 eV |
Hard X-Ray Calibration Standard (>500 nm Au)
(40 nm half-pitch or better) |
100 - 12000 eV |
Included Features:
• Nested L’s
• Siemen star patterns (large and small)
• Varying pitch gratings and mesh
• Nano USAF 1951
Custom Options |
Custom Logo (Max 50 µm2 area) |
Low stress 50 nm silicon nitride membrane |
Low stress 200 nm silicon carbide membrane |
Fused Silica Substrate (~500 um thick)
•Chrome metal on glass (positive tone-only) >60 nm thickness |
Negative polarity (features transparent)
• 40 nm minimum feature size (soft X-ray) • 80 nm minimum feature size (hard X-ray) |
Custom chip sizes |